$0.66 EPS Expected for Ichor Holdings, Ltd. (ICHR)

January 13, 2018 - By Louis Casey

 $0.66 EPS Expected for Ichor Holdings, Ltd. (ICHR)

Analysts expect Ichor Holdings, Ltd. (NASDAQ:ICHR) to report $0.66 EPS on February, 8.They anticipate $0.21 EPS change or 46.67 % from last quarter’s $0.45 EPS. ICHR’s profit would be $16.89M giving it 9.37 P/E if the $0.66 EPS is correct. After having $0.60 EPS previously, Ichor Holdings, Ltd.’s analysts see 10.00 % EPS growth. The stock decreased 1.75% or $0.44 during the last trading session, reaching $24.74. About 982,670 shares traded. Ichor Holdings, Ltd. (NASDAQ:ICHR) has 0.00% since January 13, 2017 and is . It has underperformed by 16.70% the S&P500.

Ichor Holdings, Ltd. (NASDAQ:ICHR) Ratings Coverage

Among 3 analysts covering ICHOR Corporation (NASDAQ:ICHR), 3 have Buy rating, 0 Sell and 0 Hold. Therefore 100% are positive. ICHOR Corporation had 4 analyst reports since January 11, 2017 according to SRatingsIntel. RBC Capital Markets maintained it with “Outperform” rating and $17 target in Wednesday, January 11 report. Cowen & Co maintained it with “Buy” rating and $20 target in Wednesday, February 8 report. The stock of Ichor Holdings, Ltd. (NASDAQ:ICHR) earned “Buy” rating by Needham on Friday, February 10. Cowen & Co maintained Ichor Holdings, Ltd. (NASDAQ:ICHR) rating on Wednesday, January 11. Cowen & Co has “Outperform” rating and $17 target.

Ichor Holdings, Ltd. engages in the design, engineering, and manufacture of fluid delivery subsystems for semiconductor capital equipment in the United States, the United Kingdom, Singapore, and Malaysia. The company has market cap of $633.07 million. It primarily offers gas and chemical delivery subsystems that are used in the manufacturing of semiconductor devices. It has a 12.99 P/E ratio. The companyÂ’s gas delivery subsystems deliver, monitor, and control gases used in semiconductor manufacturing processes, such as etch and deposition; and chemical delivery subsystems blend and dispense the reactive liquid chemistries used in semiconductor manufacturing processes comprising electroplating and cleaning.

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